Higher Efficiency Mask Manufacturing Through Open Data Standard

Mentor Graphics and Applied Materials collaborate on the deployment of OASIS.MASK data format for mask manufacturing, using the standard to produce Applied Aera2 advanced mask inspection system using Mentor Graphics mask data preparation software technology. ...

... "OASIS.MASK (Open Artwork System Interchange Standard for Photomasks) is an open standard interchange format used to represent and express chip level physical and mask layout data. The OASIS.MASK format reduces the size of mask data files by approximately one-half, eliminating the file transfer bottleneck between software tools and mask manufacturing equipment – a key benefit with today’s near-terabyte file sizes. As an open interface, it enables the same data file to be used for pattern generation, metrology and inspection, simplifying mask manufacturing process flows by eliminating complex format conversion steps. " ...

Via Mentor Graphics: OASIS.MASK Open Data Standard for Higher Efficiency Mask Manufacturing